The Gold Standard
Ultipleat® SP DR Filters – Advanced Contaminant Control with HAPAS* Filtration Technology
Ultipleat® SP DR Filters provide advanced 2 nanometer retention in critical surface preparation chemical baths such as HF and BOE. The patented asymmetric pore design, developed using Pall’s proprietary membrane modeling technology, reduces flow resistance and provides longer service life.
Ultipleat® SP DR Filters containing HAPAS (Highly Asymmetric Polyarylsulfone) medium are effective in a wide range of dilute and aggressive chemicals. With a highly asymmetrical polyarylsulfone pore structure that decreases in size from upstream to downstream surface, membranes exhibit superior retention, high flow rates and low pressure drops. A standard gold nanoparticle challenge shows retention of particles down to 2 nanometers.
Ultipleat® SP DR Filters are compatible with critical chemicals used in cleaning and etching.
The HAPAS filtration medium provides numerous advantages over other membranes. Its dual retention technology supports adsorption and sieving. A narrow pore distribution at the final layer captures particles by size exclusion.
This design reduces flow resistance during filtration. Higher voids volume for greater holding capacity results in a longer onstream life, and a highly asymmetric structure leads to improved pressure drop features compared to isotropic membranes. The prewet membrane has a high critical wetting surface tension and diminishes dewetting potential in aqueous applications.
Key features of this product include:
- Retention to 2 nm
- High flow rates
- High bath turnover rates for rapid particle removal.
* Highly Asymmetric Polyarylsulfone
Ultipleat® SP DR Filters use advanced filtration technology to become the next generation of improved and cost-effective membranes for contaminant removal. Contact a Pall representative for information on use, applications and purchasing.
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Providing filtration, purification and separations solutions for a broad range of fluids, such as chemicals, gas, water, CMP slurries and photoresist.
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