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Process gas filtration

The perfect process

Power Process Gas Filtration for Semiconductors

UHP Process Gas Filters are engineered to eliminate common problems that arise from traditional process gas filtering, such as the filter's potential for outgassing harmful impurities and for particle shedding. Pall’s superior filters utilize industry-leading metal fiber technology that allows for rapid gas displacement and molecular transparency during routine maintenance and system upsets. O-ringless Gaskleen® IV and V PTFE membrane eliminate o-ring deformation and filter by-pass, which is caused by incompatibility with standard o-rings when used in critical ammonia (NH3) and ozone (O3) applications.

 

Applications:

 

  • Bulk distribution systems
  • Point-of-use (POU)

 

Benefits:

 

  • Reduction in gas related defects
  • Custom media tailored to filter a variety of gases
  • Industry leading filter quality
  • Reduction in outgassing and particle impurities

 

Pall process gas filtration systems eliminate particle contaminants in crucial semiconductor UHP gas streams. Contact a Pall expert and learn more about maximizing site performance by eliminating defects and increasing yields. 

Contact our team of filtration experts for more information on improving the efficiency of your process.

 

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Providing filtration, purification and separations solutions for a broad range of fluids, such as chemicals, gas, water, CMP slurries and photoresist.

Let’s find the right solution, together.

Let’s connect. We want to share our innovative filtration solutions with you today. Contact our knowledgeable subject matter experts for information on how we can help. Thank you and we look forward to assisting you shortly.

选择行业
  • 航空航天
  • 生物制药
  • 化工与聚合物
  • 食品与饮料
  • 工业制造
  • 实验室
  • 医疗
  • 微电子
  • 石油与天然气
  • 未分类
  • 电力与公共设施
选择问题类型
  • 一般咨询
  • 产品信息
  • 价格信息
  • 技术支持
  • 订单问题
  • 质量问题

Thank You

We will get in touch with you very shortly.