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Pall Photolithography Filters – Reducing Coating Defects and Increasing Yields
The quality of the photolithography dispense process is critical to the efficiency of HBLEDs.
Reducing particulate contamination in photoresist is critical to the HBLED patterning process. Filtration of the resist removes contamination and provides consistent quality patterning. Pall Photolithography filters are available in a variety of membrane materials and removal rating to effectively eliminate contaminants while minimizing pressure drop. The Pall EZD filters are designed to minimize operator exposure to photochemical by providing a quick and easy change out method. This also minimizes filter change out time, reducing tool downtime during filter changes.
Pall Nylon 6,6 membranes filters offer higher wettability to not impede air displacement resulting in less microbubble formation and shorter purge times. Optimized filter flow paths reduce chemical usage during start-up and minimizes bubble formation that cause defects on the HBLED patterned surfaces. PTFE membranes filters offer extremely low operating pressure to minimize dispense pressures. The Ultipleat filter design provides high filter area in a small foot print to also minimize differential pressure across the filter during dispense.
To remove gels and prevent them from extruding through the filter membrane onto the HBLED patterned surface, Pall has maximized the membrane surface area in the dispense filter while minimizing the filter foot print. Pall’s advanced filter membrane designs utilize large surface areas leading to low differential pressures, which maximize gel removal efficiency and minimize microbubble formation. Low operating pressure ensures that the filter will not cause photochemicals to outgas as it is dispensed from high pressure to low pressure during the dispense process.
Keeping particles minimized in photoresist chemistries is of utmost concern to Pall engineers. Selecting the proper filter can essentially remove or minimize these contaminants without altering the photoresist chemistry. Pall PTFE membranes are known for their excellent chemical compatibility and minimal contribution of extractables.
The PhotoKleen EZD filter assembly is designed for clean, simple, safe and fast filter change outs in point-of-use photochemical dispense applications. The PhotoKleen EZD filter assembly consists of a head manifold interface and an HDPE or PFA capsule filter. It is ideal for improving the performance of existing installations and can be specified on new, state-of-the art dispense pumps.
Several factors must be considered in the selection of the appropriate photolithographic filter. Bulk filters and point-of-use (POU) dispense filters prevent the deposition of unwanted particles. The POU filter is an integral part of any precision dispense system, therefore careful selection of this filter is necessary to reduce defects on the HBLED patterned surface. In addition to particle and gel removal, minimization of microbubble formation, reduced chemical consumption and good compatibility are all key areas for POU filter selection. The design of Pall’s point-of-use capsules also locates the vent at the highest point of the capsule to ensure complete and easy venting.
- Minimize operator exposure to photoresist chemical
- Fast filter changes outs to minimize tool down time
- Low pressure drop for longer filter life
- Higher HBLED yields and decreased pattern defects
- Variety of removal ratings for thick photolithography applications
- Rapid Venting Design (Minimal Microbubble Production)
Pall Photolithography Filter technologies streamline manufacturing operations and decrease down time of dispensing systems all while decreasing HBLED pattern defects. For more information, contact a Pall expert on how to optimize your photolithography process.
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