Superior filtration performance
Premium CMP Filtration Improves Process Stability for Microelectronics Manufacturing
Contamination control is one of the most critical concerns in LED manufacture. Pall CMP filters maximize LED process performance by controlling the shape, size, and concentration of slurry particles leading to higher yields and less defects. They control slurry particle size, shape, and density of Large Particle Counts (LPCs) to LED manufacturing process parameters. This superior filtration performance reduces defects and process excursions like micro scratching, unstable polish rates, chemical reactions, and stress fractures.
Slurry filters are normally situated in two locations in a hard disk polishing system:
- In the slurry recirculation loop
- At the point-of-use (POU) where a capsule filter is installed closer to the polish tool
Pall offers a variety of media and configurations for both bulk and POU applications to enable substrate/media producers to meet ultra-smooth wafer requirements.
The filters can be customized for different working pressures as well as slurry chemistries. Enhanced process control and stability, increased area/process efficiency, and extended slurry life are all benefits of Pall’s premium CMP filters. A range of flow rates can be accommodated, and greater surface area leads to longer tool life. This superior solution provides longer intervals between change outs, while smaller capsule size enables installation at or near the tool.
Our CMP Filters maximize the performance of any LED CMP process by eliminating contaminants and controlling slurry size, shape and chemistry. Contact a Pall expert show you how to optimize your CMP slurry filtration and maximize your site’s performance.
Contact our team of filtration experts for more information on improving the efficiency of your process.
Proudly providing innovative filtration and purification solutions specifically designed to streamline LED process efficiency and improve business performance
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