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LED

提供创新过滤和纯化解决方案,专门设计用于简化LED工艺效率和提高业务绩效。

帮助LED生产商发出耀眼光芒

确保资产设备寿命和实现期望的LED品质。

通过采用我们的高效过滤器技术,可以实现工艺稳定性并维持所需工艺条件,实现最高产量和最低运行成本。选择合适的过滤技术对于产品质量最大化、改善设备运行时间以及将制造成本保持在尽可能低的水平具有至关重要的作用。颇尔过滤技术十分适用于LED生产过程,包括超纯水过滤和工艺气体纯化/过滤。我们提供持久耐用的过滤和纯化解决方案,它们专门设计用于简化LED过程效率和提高业务绩效。

 

通过保护重要衬底表面免遭颗粒污染,从而避免导致缺陷和产量问题,我们的高性能过滤器可实现最高LED品质。如未经过有效的过滤,设备的意外停机时间(UPDT)以及计划中或计划外的设备维护频率都会急剧增加。有效并可靠地清除污染物还可提高下游LED工艺的效率,这些工艺直接影响设备使用寿命,并有助于缩短停机维护时间。

CMP

Pall CMP Filters maintain slurry chemistry, control particle size, and limit particle density. The advanced filters provide users with effective removal of contaminants that can be tailored to fit any LED manufacturer’s specific process chemistries.
Pall CMP Filters maintain slurry chemistry, control particle size, and limit particle density. The advanced filters provide users with effective removal of contaminants that can be tailored to fit any LED manufacturer’s specific process chemistries.
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光刻

颇尔光刻过滤器使用各种专业膜材,将压降降至最低并减少颗粒污染。颇尔采用优质的过滤器设计,缩短启动时间,尽量减少操作员被曝露在HBLED生产过程中使用的光刻胶里的时间。
颇尔光刻过滤器使用各种专业膜材,将压降降至最低并减少颗粒污染。颇尔采用优质的过滤器设计,缩短启动时间,尽量减少操作员被曝露在HBLED生产过程中使用的光刻胶里的时间。
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Process gas filtration

High-capacity process gas purifiers remove moisture, oxygen, carbon dioxide and other contaminants from process gases such as nitrogen, ammonia, argon, and hydrogen to improve LED manufacturing efficiency and reduce equipment maintenance time and cost.
High-capacity process gas purifiers remove moisture, oxygen, carbon dioxide and other contaminants from process gases such as nitrogen, ammonia, argon, and hydrogen to improve LED manufacturing efficiency and reduce equipment maintenance time and cost.
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Process gas purification

Pall’s Process Gas Purification Systems eliminate and minimize harmful molecular contaminants that cause defects on the LED substrate. Molecular impurities in the process gases such as siloxanes and moisture can lead to process inconsistencies, ultimately leading to destructive level defects and reduced LED quality.
Pall’s Process Gas Purification Systems eliminate and minimize harmful molecular contaminants that cause defects on the LED substrate. Molecular impurities in the process gases such as siloxanes and moisture can lead to process inconsistencies, ultimately leading to destructive level defects and reduced LED quality.
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Trace moisture detection

Moisture contamination is hazardous to the LED manufacturing process. Manufactures must rely on robust detection systems to detect trace moisture contaminant levels in high purity electronics grade gases.
Moisture contamination is hazardous to the LED manufacturing process. Manufactures must rely on robust detection systems to detect trace moisture contaminant levels in high purity electronics grade gases.
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Ultrapure Water

Pall Ultrapure Water Filtration products reliably remove colloidal contaminants such as silica and bacterial breakdown products. Pall UPW Filters efficiently remove contaminants at certain parts of the UPW system to reduce surface LED defects seen from bacteria and particulate contaminants.
Pall Ultrapure Water Filtration products reliably remove colloidal contaminants such as silica and bacterial breakdown products. Pall UPW Filters efficiently remove contaminants at certain parts of the UPW system to reduce surface LED defects seen from bacteria and particulate contaminants.
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Wet etch and cleans

Ultipleat® SP DR Filters offer exceptional retention, flow rates and pressure drops as lower-cost alternatives to all-perfluoropolymeric filters.
Ultipleat® SP DR Filters offer exceptional retention, flow rates and pressure drops as lower-cost alternatives to all-perfluoropolymeric filters.
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减少支出。增加价值。

凭借经济可靠的过滤效果,先进的过滤方案可实现最大化的LED产量,减少衬底缺陷,延长化学品寿命并缩短设备UPDT。

制造成本至关重要,因为消费者想要获得更廉价的照明解决方案。为了获得低价并能够与其它照明系统相竞争,需要进行有效过滤,以延长化学品寿命,减少缺陷和增长设备寿命。我们拥有有助于改进各种化学品工艺的过滤技术、制造经验和工艺知识。

 

我们已经为几乎所有LED工艺步骤设计了特定过滤技术,从晶锭生长、成型以及晶圆到薄膜加工和超纯水过滤。大规模的LED制造过程推动制造精度要求日益严格,为生产出更好的衬底从而获得更高效的LED。LED工艺对污染物非常敏感。水分和颗粒等杂质会直接影响各工艺步骤,导致计划外维护频率和停机时间的增加,LED产品品质明显降低。

 

清除工艺气流中的分子级颗粒物对于保证资产设备寿命和产生期望的LED品质非常关键。不可否认,颇尔对纯度和防护的专注造就了成熟的工业应用和成果。为了有效生产新型高效的LED系统需要的衬底,关键步骤需要免受污染,否则缺陷将急剧增加。衬底清洗和制备对于成功清除进入表面的污染物非常关键。

 

我们拥有用于超纯水过滤和工艺气体过滤/纯化的过滤器方案。无论是最初的晶锭生长工艺还是最终的薄膜涂层工艺,颇尔过滤都可提供污染物清除方案,以达到LED制造商期望的水平。

 

通过清除关键工艺气流中的污染物从而减少缺陷,颇尔LED过滤技术可帮助实现制造工艺效果最优化。点击此处查看颇尔专家介绍如何优化LED工艺,实现工厂最佳产品质量,延长设备寿命和提高性能以及降低运行成本。

不可否认,颇尔对纯度和防护的专注造就了成熟的工业应用和成果。