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Photolithography

Chemically compatible

Photolithography Filters – Decreasing Coating Defects and Increasing Yields

Lithography coating needs to be free of particles, metals, organic materials and bubbles. To achieve defect free coatings, filters must have very high retention while minimizing any source for contamination. Pall photolithography filters use a variety of membrane materials to effectively eliminate contaminants and defects in photolithography process chemicals. They reduce chemical waste and start-up time associated with filter changes, and offer finer removal characteristics and superior initial cleanliness over previous products.

 

Several factors must be considered in the selection of the appropriate microlithographic filter. Bulk filters and point-of-use (POU) dispense filters prevent the deposition of unwanted particles. The POU filter is an integral part of any precision dispense system; therefore, careful selection of this filter is necessary to reduce defects on the wafer surface. Optimized design for point of use dispense, a swept flow path design, and excellent purging characteristics are all crucial.

 

In addition to particle and gel removal, minimization of microbubble formation, reduced chemical consumption and good compatibility are all key for POU filter selection. Chemically compatible with various photolithography solvents, including PGMEA, PGME, EL, GBL and cyclohexanone, Pall’s optimized filter designs reduce chemical usage during start-up and use large surface areas. As a result, low differential pressures maximize gel removal efficiency and minimize microbubble formation. Low operating pressure ensures the filter will not cause photochemicals to outgas as they are dispensed from high pressure to low pressure during process.

 

Benefits:

  • Decreased equipment downtime
  • Higher yields
  • Increased chemical and dispense nozzle life
  • Variety of membranes for any photolithography application
  • Rapid Venting Design (Minimal Microbubble Production)
  • Reduced chemical waste

 

Our photolithography filter technologies streamline manufacturing operations, decrease downtime of dispense systems, and decrease wafer surface defects. For more information, contact a Pall expert for purchase information.     

Contact our team of filtration experts for more information on improving the efficiency of your process.

 

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选择行业
  • 航空航天
  • 生物制药
  • 化工与聚合物
  • 食品与饮料
  • 工业制造
  • 实验室
  • 医疗
  • 微电子
  • 石油与天然气
  • 未分类
  • 电力与公共设施
选择问题类型
  • 一般咨询
  • 产品信息
  • 价格信息
  • 技术支持
  • 订单问题
  • 质量问题

Thank You

We will get in touch with you very shortly.