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Wet etch & cleans

Increase Yield. Lower Costs.

Wet Etch Clean Filters – Improving Media and Substrate Cleanliness

Advanced Wet Etch Clean Filters provide improved bath cleanliness, by providing sub-micron filtration at very low pressure drops, thereby achieving high levels of particle retention without sacrificing flow rate. They are customizable and work to prevent particulate from reaching the hard disk’s surface. Wet Etch Clean filters aggressively eliminate particulate in chemical and D.I. Water baths that can cause defects in hard disk media.

 

Applications:

  • Recirculating baths
  • Single Pass Systems

 

Benefits:

  • Enhanced process stability
  • Extended chemical life
  • Reduction in hard disk defects 

 

Our Wet Etch Clean Filters eliminate defects on both glass and aluminum substrates, while maintaining long filter lifetime, thereby reducing your cost per disk. Contact a Pall expert and learn how you can better control your process conditions to improve operating cost, increase yield and lower your cost per disk. 

Contact our team of filtration experts for more information on improving the efficiency of your process.

 

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Maximized Performance

Data Storage CMP Filtration That Improves Process Capability And Reduces Microscratches

Let’s find the right solution, together.

Let’s connect. We want to share our innovative filtration solutions with you today. Contact our knowledgeable subject matter experts for information on how we can help. Thank you and we look forward to assisting you shortly.

选择行业
  • 航空航天
  • 生物制药
  • 化工与聚合物
  • 食品与饮料
  • 工业制造
  • 实验室
  • 医疗
  • 微电子
  • 石油与天然气
  • 未分类
  • 电力与公共设施
选择问题类型
  • 一般咨询
  • 产品信息
  • 价格信息
  • 技术支持
  • 订单问题
  • 质量问题

Thank You

We will get in touch with you very shortly.